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...Titanium Sputtering Target PVD Coating Rotary Tube Targets Titanium target is one of the commonly used targets for preparing thin film materials, and has been widely used in magnetron sputtering technology. Such as integrated circuits, decorative coating industry, flat display and so on are needed. Therefore, the quality of titanium target is very important, and good titanium target can prepare qualified PVD coating. Titanium...
...Titanium Sputtering Target PVD Coating Rotary Tube Targets Titanium target is one of the commonly used targets for preparing thin film materials, and has been widely used in magnetron sputtering technology. Such as integrated circuits, decorative coating industry, flat display and so on are needed. Therefore, the quality of titanium target is very important, and good titanium target can prepare qualified PVD coating. Titanium... more
Brand Name:Changsheng
Model Number:Titanium Sputtering Target Tube Targets
Place of Origin:China
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... beam or ion beam, just like the target is hit, so the material used in the sputtering process is called the "sputtering target". From metal titanium to titanium sputtering target Titanium sputtering target is a titanium product made of titanium metal as
... beam or ion beam, just like the target is hit, so the material used in the sputtering process is called the "sputtering target". From metal titanium to titanium sputtering target Titanium sputtering target is a titanium product made of titanium metal as more
Brand Name:LHTI
Model Number:LH-10
Place of Origin:China
99.6% Purity GR1 GR2 Round Titanium Sputtering Target Hardware
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Titanium Sputtering Target 99.5%, 99.95% D100x40mm , D65x6.35mm Purity is the main performance index of the target material, because the purity of the target material has a great influence on the performance of the film. Main performance requirements of target material: Purity is the main performance index of the target material, because the purity of the target...
Titanium Sputtering Target 99.5%, 99.95% D100x40mm , D65x6.35mm Purity is the main performance index of the target material, because the purity of the target material has a great influence on the performance of the film. Main performance requirements of target material: Purity is the main performance index of the target material, because the purity of the target... more
Brand Name:JINXING
Model Number:Titanium Sputtering Target
Place of Origin:China
High Purity 99.5% Titanium Sputtering Target For Pvd Coating System
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...wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port The coating target is a sputtering source that forms various functional films on the substrate by magnetron sputtering, multi-arc ion plating or other types of
...wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port The coating target is a sputtering source that forms various functional films on the substrate by magnetron sputtering, multi-arc ion plating or other types of more
Brand Name:Feiteng
Model Number:Titanium tube target
Place of Origin:Baoji, Shaanxi, China
Vacuum Coating Gr1 Titanium Sputtering Target 133OD*125ID*840L
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... resistance. 3.Grain size uniformity. Customized service. About sputtering Sputtering is essential technology in different industries as follows Architecture glass, PV/Solar,Decoration, Semiconductor,Optics/Optronics, FPD. 1.Packaging ...
... resistance. 3.Grain size uniformity. Customized service. About sputtering Sputtering is essential technology in different industries as follows Architecture glass, PV/Solar,Decoration, Semiconductor,Optics/Optronics, FPD. 1.Packaging ... more
Brand Name:Forged
Model Number:customized
Place of Origin:Luoyang
No Scratches Titanium Sputtering Target High Strength Purity
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Product Information: Product name Gr2 Gr1 DIA 100*40MM Round Titanium Sputtering Target For Vacuum Coating Shape round/Square according to your request Density ≥4.51g/cm³ Type As per customers' requirement Standard ASTM ...
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... Titanium 99.99% 4n Disc High Purity Ti Metal Sputtering Target Titanium is metallic and ductile. Sound travels at a rate of 5,090 m/s. The main characteristics of titanium are low density, high mechanical strength and easy processing. The new titanium ...
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W Tungsten Sputtering Targets Aerospace, Rare Earth Smelting Tungsten Sputtering Targets widely used in Aerospace, rare earth smelting, electric light source, chemical equipment, medical equipment, metallurgical machinery, smelting equipment, petroleum...
W Tungsten Sputtering Targets Aerospace, Rare Earth Smelting Tungsten Sputtering Targets widely used in Aerospace, rare earth smelting, electric light source, chemical equipment, medical equipment, metallurgical machinery, smelting equipment, petroleum... more
Model Number:Tungsten Sputtering Target
Minimum Order Quantity:Negotiate
Price:Negitionable
W Tungsten Target Rare Earth Smelting Titanium Tungsten Sputtering Target
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...Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering
...Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering more
Brand Name:Sanhui
Model Number:Mo1
Place of Origin:Henan, China
10.2g/Cm3 Pure Molybdenum Rectangular/Round Plate Sputtering Target For Coating
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High temperature resistant high quality fused silica sputtering target Silicon dioxide sputtering target contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a natural compound made from two of the most abundant materials on the planet: ...
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NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy Products Description Product Name Nickel 200 Width 1000mm/1219mm/1240mm/1500mm or as customer's requirements Technique Hot rolled cold rolled Length as customer's request ...
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... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and
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Torich 133*4*4113mm 304L Planar Sputtering Target Sputtering Target Stainless Steel Tube Torich 133*4*4113mm 304L Sputtering Target Stainless Steel Tube Grade:304L Specification: 133*4*4113mm Tolerance of OD:0.1-0.4mm Tolerance of ID:124.5-125.2mm ...
Torich 133*4*4113mm 304L Planar Sputtering Target Sputtering Target Stainless Steel Tube Torich 133*4*4113mm 304L Sputtering Target Stainless Steel Tube Grade:304L Specification: 133*4*4113mm Tolerance of OD:0.1-0.4mm Tolerance of ID:124.5-125.2mm ... more
Brand Name:TORICH
Model Number:304L
Place of Origin:China
DIN2462 Stainless Steel Tubing For Planar Sputtering Target
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Molybdenum Copper Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron sputtering targets is mainly by infiltration method. First, molybdenum powder...
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...Sputtering Target plate sheets Product Description - uniform grain with densified microstructure ensures longer use time. - High special strenghth, high melt point - excellent corrosive resistance, good thermal resistance. - professional after-sales service Commodity Name Pure molybdenum sputtering target...
...Sputtering Target plate sheets Product Description - uniform grain with densified microstructure ensures longer use time. - High special strenghth, high melt point - excellent corrosive resistance, good thermal resistance. - professional after-sales service Commodity Name Pure molybdenum sputtering target... more
Brand Name:HMD
Model Number:NONE
Place of Origin:CHN
TZM Molybdenum Disc SGS Molybdenum Sputtering Target For Medical Chemical Industrial
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HighPurityTitaniumVacuumTargetfor Vacuum Coating 1.Name:Titaniumroundtarget 2.Materials:Gr1 Gr2 titanium,TiAl alloy 3.Purity:more than 99.5% 4.Application:vacuum coating decoration 5.Available Material:Gr1, Gr2, Gr3, Gr4, Gr5, Gr7, Gr9, Gr12, Gr23 6.Size ...
HighPurityTitaniumVacuumTargetfor Vacuum Coating 1.Name:Titaniumroundtarget 2.Materials:Gr1 Gr2 titanium,TiAl alloy 3.Purity:more than 99.5% 4.Application:vacuum coating decoration 5.Available Material:Gr1, Gr2, Gr3, Gr4, Gr5, Gr7, Gr9, Gr12, Gr23 6.Size ... more
Brand Name:huaheng titanium
Model Number:HUAHENG01
Place of Origin:Baoji
Titanium Alloy Target for Vacuum Coating
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Hafnium Pellet 99.9% Pure Hf pellet 3N for sale Products attributes of Hf pellets Item Name PVD Coating materials Hf pellet Purity 99.99% Shape Square/Round, According to your request according to your request Available size Normal size:2*5mm,3*3mm,6*6mm ...
Hafnium Pellet 99.9% Pure Hf pellet 3N for sale Products attributes of Hf pellets Item Name PVD Coating materials Hf pellet Purity 99.99% Shape Square/Round, According to your request according to your request Available size Normal size:2*5mm,3*3mm,6*6mm ... more
Brand Name:High Broad
Model Number:Hf sputtering targets
Place of Origin:China
Pure Rare Earth Oxides Hafnium Cylinder Pellet Hf Sputtering Targets Material
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Corrosion Resistance Titanium Alloy Pvd Target For Medical / Industrial Coating Specification: Item Name GR1 GR2 GR5 Titanium Alloy pvd Targets/Titanium Sputtering Targets for coating Material Titanium (Gr1, Gr2, Gr5, Gr7,GR12) Alloy target: Ti-Al, Ti-Cr, ...