High Temperature Resistant Sio2 Sputtering Targets Quartz ring has the characteristics of high temperature resistance, corrosion resistance, good light transmission, moisture-proof and explosion-proof. The quartz ring has unique optical properties and is a...

... are well known and extensively used in PVD coating field because of the high purity, fine grain sizes, homogeneous microstructure, excellent surface condition and accurate dimensions. Zirconium sputtering target is available in various forms, purities,

...Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering

...sputtering target material is produced by the advanced hot isostatic pressing (HIP) process. sputtering target include rectangular target, arc target, ring target and large aspect ratio integrally formed tube target, etc., with controllable purity and density, and fine...

...sputtering target for coating industry rosegold color Product name: Titanium aluminum alloy target Material: TiAl (Titanium aluminum alloy) Composition of TiAl: 25/75 30/70 33/67 40/60 45/55 50/50 Shape: Round target Size: Dia99x40 Dia160x12 Dia128x15 Dia105x16 Dia100x32 Dia64x32 Or as customer's requests Or as customer's requests Titanium aluminum alloy target characteristics: High purity, fine...

... spectrometry (GDMS), and inductively coupled plasma (ICP); 2. Tungsten target from Achemetal is provided with high purity up to 99.97%, density 18.8-19g/cm3, homogeneous organization structure, and fine grain; 3. Our tungsten sputtering target has been

Working Principle: Sputter deposition is a physical vapor deposition (PVD) method of thin film deposition by sputtering. This involves ejecting material from a "target" that is a source onto a "substrate" such as a silicon wafer. Resputtering is re-...

SiO2 granule 0.5-3mm 1-3mm 2-4mm or customization 99.99% Chemical name: SiO2 Boiling point: 2230℃ Purity: 4N Specification: 1-4mm, particle, target Molecular weight: 60.08 Appearance: white Melting point: 1700℃ Density: 2.2-2.7g/cm3 In 10-4Torr vacuum evaporation temperature is: 1025℃ Transparent area /nm:200-8000 Relative dielectric constant: 3-4 Breakdown voltage /V? Cm-1:106 Thickness:0.03-0.3μm Deposition technology: reactive sputtering

..., high density, fine, and uniform grain characteristics are present in molybdenum sputtering targets, resulting in extremely high sputtering efficiency, uniform film thickness, and a smooth etching surface during the sputtering process. Molybdenum sheet...