Silver Titanium Sputtering Target CNC Casting OEM For Electrochemistry Equipment
|
Titanium Target Sputtering Coating Titanium Round Target Strip Target Plate Sputtering target (purity: 99.9%-99.999%)Square Pure Titanium Sputtering Target High Purity 99.995% Circular Ti Titanium Sputtering Target PVD coating Grade 1 Titanium Arc Target Ti Target titanium sputtering target ★ Material Titanium titanium grade 1 Key words Titanium sputtering target Titanium sputtering target , target pure titanium target, MMO Coating Titanium......
Baoji Quality Metals Co., Ltd.
|
99.995% Purity Titanium Sputtering Target PVD Coating Rotary Tube Targets
|
...Titanium Sputtering Target PVD Coating Rotary Tube Targets Titanium target is one of the commonly used targets for preparing thin film materials, and has been widely used in magnetron sputtering technology. Such as integrated circuits, decorative coating industry, flat display and so on are needed. Therefore, the quality of titanium target is very important, and good titanium target can prepare qualified PVD coating. Titanium......
Baoji City Changsheng Titanium Co.,Ltd
|
99.6% Purity GR1 GR2 Round Titanium Sputtering Target Hardware
|
... beam or ion beam, just like the target is hit, so the material used in the sputtering process is called the "sputtering target". From metal titanium to titanium sputtering target Titanium sputtering target is a titanium product made of titanium metal as...
Baoji Lihua Nonferrous Metals Co., Ltd.
|
High Purity 99.5% Titanium Sputtering Target For Pvd Coating System
|
Titanium Sputtering Target 99.5%, 99.95% D100x40mm , D65x6.35mm Purity is the main performance index of the target material, because the purity of the target material has a great influence on the performance of the film. Main performance requirements of target material: Purity is the main performance index of the target material, because the purity of the target......
JINXING MATECH CO LTD
|
Vacuum Coating Gr1 Titanium Sputtering Target 133OD*125ID*840L
|
...wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port The coating target is a sputtering source that forms various functional films on the substrate by magnetron sputtering, multi-arc ion plating or other types of...
Baoji Feiteng Metal Materials Co., Ltd.
|
No Scratches Titanium Sputtering Target High Strength Purity
|
... resistance. 3.Grain size uniformity. Customized service. About sputtering Sputtering is essential technology in different industries as follows Architecture glass, PV/Solar,Decoration, Semiconductor,Optics/Optronics, FPD. 1.Packaging ......
Luoyang Forged Tungsten-Molybdenum Material Co., Ltd.
|
Gr2 Gr1 DIA 100*40MM Round Titanium Sputtering Target For Vacuum Coating
|
Product Information: Product name Gr2 Gr1 DIA 100*40MM Round Titanium Sputtering Target For Vacuum Coating Shape round/Square according to your request Density ≥4.51g/cm³ Type As per customers' requirement Standard ASTM ......
Shaanxi Peakrise Metal Co.,Ltd
|
99.99% Pure Titanium Disc 4n High Purity Ti Metal Sputtering Target Low Density
|
... Titanium 99.99% 4n Disc High Purity Ti Metal Sputtering Target Titanium is metallic and ductile. Sound travels at a rate of 5,090 m/s. The main characteristics of titanium are low density, high mechanical strength and easy processing. The new titanium ......
Gnee (Tianjin) Multinational Trade Co., Ltd.
|
W Tungsten Target Rare Earth Smelting Titanium Tungsten Sputtering Target
|
W Tungsten Sputtering Targets Aerospace, Rare Earth Smelting Tungsten Sputtering Targets widely used in Aerospace, rare earth smelting, electric light source, chemical equipment, medical equipment, metallurgical machinery, smelting equipment, petroleum......
Luoyang Hypersolid Metal Tech Co., Ltd
|
10.2g/Cm3 Pure Molybdenum Rectangular/Round Plate Sputtering Target For Coating
|
...Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering...
Zhengzhou Sanhui Refractory Metal Co., Ltd.
|
Submit your “titanium sputtering target” inquiry in a minute :