Copper Rotatable Sputtering Target High Density With Smooth Surface
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Copper Rotatable Sputtering Target Ultra high purity 99.999%, 99.9999% 6N ultra-high purity electrolytic copper is mainly used in the production of sputtering target, evaporation film and anode materials for integrated circuits. Purity: 99.999% ~ 99.9999......
JINXING MATECH CO LTD
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Gr1 Gr2 Pure Titanium Target Disc Sputtering Target High Density
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... Replace different target materials (such as aluminum, copper, stainless steel, titanium, nickel targets, etc.), you can get different film systems (such as super-hard, wear-resistant, anti-corrosion alloy film, etc.). (1) Metal targets: nickel target, Ni,...
Baoji Lihua Nonferrous Metals Co., Ltd.
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Pure Zirconium Sputtering Target Low Density Good Thermal Properties
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high purity 99.95% zirconium sputtering target coating materials customization Zirconium Description Zirconium and zirconium alloys have low density, high specific strength, corrosion resistance, radiation resistance, excellent wear resistance, excellent ......
Luoyang Forged Tungsten-Molybdenum Material Co., Ltd.
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99.99% Pure Titanium Disc 4n High Purity Ti Metal Sputtering Target Low Density
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... Ti Metal Sputtering Target Titanium is metallic and ductile. Sound travels at a rate of 5,090 m/s. The main characteristics of titanium are low density, high mechanical strength and easy processing. The new titanium alloy has good heat resistance and ......
Gnee Steel (tianjin) Co., Ltd.
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Metal Titanium Sputtering Target Magnetron For LCD Screen CNC Machined
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... target (purity: 99.9%-99.999%) Titanium target plate High-purity and high-density titanium sputtering target Titanium target Titanium sputtering target material Used for liquid crystal display, laser memory, electronic controller, sputtering thin...
Baoji Quality Metals Co., Ltd.
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10.2g/Cm3 Pure Molybdenum Rectangular/Round Plate Sputtering Target For Coating
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...Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering...
Zhengzhou Sanhui Refractory Metal Co., Ltd.
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Sputtering Target Chromium Cr 100x40mm Hot Isostatic Pressing
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...sputtering target material is produced by the advanced hot isostatic pressing (HIP) process. sputtering target include rectangular target, arc target, ring target and large aspect ratio integrally formed tube target, etc., with controllable purity and density......
Baoji City Changsheng Titanium Co.,Ltd
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Frosting Silicon Dioxide Sputtering Target 1100Mpa High Corrosion Resistance
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Silicon Dioxide Sputtering Target By Chinese Manufacturers Factory Chemical formula:SiO2 Molar mass:60.08 g/mol Density:2.648 (α-quartz), 2.196 (amorphous) g·cm−3 Melting point:1,713 °C (3,115 °F; 1,986 K) Boiling point:2,950 °C (5,340 °F; 3,220......
Yantai ZK Optics Co., Ltd.
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Molybdenum Planar Sputtering Targets
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... Sputtering Target Molybdenum Sputtering Target 10.2g/Cm3 Molybdenum Plate 10.2g/Cm3 Send Email Inquiry Now Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets are mainly used for flat panel displays,...
Luoyang Hypersolid Metal Tech Co., Ltd
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TZM Molybdenum Disc SGS Molybdenum Sputtering Target For Medical Chemical Industrial
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...Sputtering Target plate sheets Product Description - uniform grain with densified microstructure ensures longer use time. - High special strenghth, high melt point - excellent corrosive resistance, good thermal resistance. - professional after-sales service Commodity Name Pure molybdenum sputtering target Density......
HENAN HUAMAO METAl MATERIALS CO ,LTD
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