| Categories | Fused Quartz Plate |
|---|---|
| Brand Name: | ZMSH |
| Model Number: | 8 Inch Quartz Wafer |
| Certification: | rohs |
| Place of Origin: | CHINA |
| MOQ: | 10 |
| Price: | by case |
| Payment Terms: | T/T |
| Supply Ability: | 1000pcs per month |
| Delivery Time: | 5-8weeks |
| Packaging Details: | Package in 100-grade cleaning room |
| Diameter: | 200 mm (8-inch) |
| Thickness Range: | 100 μm – 3000 μm |
| Total Thickness Variation (TTV): | ≤10 μm |
| Surface Roughness (Ra): | ≤1.0 nm |
| otal Impurity Content: | ≤2.0 μg/g (High-Purity Grade) |
| Applications: | Semiconductor Lithography Masks, UV Optical Devices, MEMS Sensors, Laser Systems |
The 8-inch quartz wafer is a precision substrate material fabricated from high-purity synthetic quartz glass (SiO₂), offering exceptional physical, chemical, and optical properties. With a standard diameter of 200mm (8 inches) and customizable thickness (e.g., 0.5mm–10mm), it is widely used in high-end semiconductor, optoelectronic, and optical applications. Due to its ultra-high purity (≥99.99%), low coefficient of thermal expansion, outstanding thermal stability, and superior UV-IR transmittance, quartz wafers are an ideal choice for critical processes such as photolithography, etching, and thin-film deposition. Additionally, their stable dielectric properties and radiation resistance make them suitable for high-precision sensors and aerospace-grade components.
| Parameters | Values/Specifications |
| Diameter | 200 mm (8-inch) |
| Thickness Range | 100 μm – 3000 μm |
| Total Thickness Variation (TTV) | ≤10 μm |
| Surface Roughness (Ra) | ≤1.0 nm |
| Total Impurity Content | ≤2.0 μg/g (High-Purity Grade) |
| Thermal Expansion Coefficient | 0.55×10⁻⁶/K (20–300°C) |
| Temperature Resistance | Softening Point 1683°C, Short-term Tolerance up to 1450°C |
| UV Transmittance | >90% Average Transmittance (200–260 nm) |
| Applications | Semiconductor Lithography Masks, UV Optical Devices, MEMS Sensors, Laser Systems |
1. High Purity (≥99.99%): Minimizes impurities in semiconductor processes, improving yield.
2. Excellent Thermal Stability: Softening point up to 1730°C, suitable for high-temperature processes (e.g., diffusion, oxidation).
3. Low Thermal Expansion (5.5×10⁻⁷/°C): Reduces deformation under thermal stress, enhancing machining precision.
4. High Transmittance (185nm–2.5μm): Ideal for UV lithography, optical sensors, and laser applications.
5. Chemical Resistance: Resists strong acids (except HF) and alkalis, suitable for wet etching environments.
6. High Flatness (<1μm TTV): Ensures uniformity in photolithography and thin-film deposition.
| Industry | Applications | Key Benefits |
| Semiconductor | Photomask substrates, etching carriers, CMP polishing pads, diffusion process trays | High-temperature stability, ultra-low defects, ensures chip manufacturing precision |
| Photovoltaics | PECVD processes for solar cells, diffusion furnace carriers, thin-film deposition substrates | Thermal shock resistance, enhances cell efficiency |
| Optoelectronics | LED/LD substrates, laser windows, optical sensor protection | High UV-IR transmittance, low fluorescence, improves device performance |
| Precision Optics | Lens substrates, prisms, beam splitters, IR windows | Low thermal expansion, high homogeneity, ensures optical system stability |
| Research & Lab | Synchrotron radiation devices, VUV experiments, high-energy physics detectors | Radiation-resistant, withstands extreme environments |
| Aerospace | Satellite optical windows, high-temperature observation windows for spacecraft | Cosmic ray resistance, thermal shock endurance, space-ready |
ZMSH specializes in R&D, production, and sales of high-precision quartz glass products, offering:
· Multiple Sizes: 2"–12" wafers, with non-standard customizations (e.g., square, special shapes).
· Diverse Shapes: Round, square, annular, sector-shaped, etc., tailored to equipment needs.
· Material Options: Synthetic quartz (JGS1/JGS2/JGS3), fused silica, low-OH quartz.
· Surface Treatments: Polishing, coatings (AR/IR/DLC), drilling, grooving, etc.
· Industry-Specific Solutions: Custom quartz components for semiconductors, photovoltaics, optical communications, etc.
Brief intro of quartz glass windows:
ZMSH provides precision-customized quartz glass windows for UV-Vis-IR optical systems. Customizable features include:
· Shapes: Round, square, rectangular, or complex geometries.
· Dimensions: Diameter 1mm–500mm, thickness 0.1mm–50mm.
· Surface Finishes: Double-side polishing, AR coatings, metal coatings.
· Applications: Laser windows, vacuum viewports, high-temperature viewfinders, spectrometer components.
Equipped with advanced CNC engraving, laser cutting, and coating technologies, ZMSH guarantees high transmittance, low wavefront distortion, and environmental durability.
Prototyping and mass production available—contact us for tailored solutions!
1. Q: What is the standard thickness of an 8-inch quartz wafer?
A: The standard thickness ranges from 0.5mm to 1.0mm, with custom options up to 10mm for specific semiconductor applications.
2. Q: Why use quartz wafers instead of silicon wafers?
A: Quartz wafers provide superior UV transparency (>90% @193nm), higher thermal stability (up to 1730°C), and better chemical resistance than silicon for lithography and harsh environment processes.
Tags: #8 Inch Quartz Substrate, #Customized, #Fused Silica Plates, #SiO₂ Crystal, #Quartz wafers, #JGS1/JGS2 Grade, # High-Purity, #Fused Silica Optical Components, #Quartz Glass Plate, #Diameter 200mm, #Quartz Crystal Glass Wafer, #5N Purity SiO₂, #Heat-Resistant, #Transparent, #Monocrystalline Quartz Crystal Substrate, #TTV ≤10μm, #Ra ≤1.0 nm, #High-Precision Sensors
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