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N-Bk7 Fused Silica Quartz Optical UV Cut Filter For Optical Metrology

Categories Optical Filter
Place of Origin: Shanghai, China
Brand Name: LONGWAY
Model Number: LW00511
Packaging Details: electrolytic capacitor paper,foam,carton
Supply Ability: 80000 Pieces per Month
MOQ: 500 pieces
Price: NEGOTIATION
Certification: ISO9001
Payment Terms: D/P,T/T,Western Union
Surface quality: optical grade
Transmission: over 90%
Coating: available
Processing: grinding and polishing
Application: Optics and lighting
OEM: available
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N-Bk7 Fused Silica Quartz Optical UV Cut Filter For Optical Metrology



N-Bk7 Fused Silica Quartz Optical UV Cut Filter For Optical Metrology


Material:

  • N-Bk7 (N-BK7), fused silica glass, known for its excellent optical properties
  • High-quality quartz glass, resistant to thermal shock and scratches

Quality:

  • Excellent transmission and absorption characteristics
  • Low scatter and haze values
  • High-precision manufacturing process ensures consistent quality

Function:

These filters selectively transmit specific wavelengths of light while absorbing others, allowing for precise control over the spectral content of an optical system.


Applications:

  1. UV Cutting: Used in UV cutting applications where a high-quality filter is required.
  2. Precision Laser Cutting: Employed in precision laser cutting applications where a medium-quality filter is sufficient.
  3. Optical Metrology: Utilized in optical metrology applications where a high-quality filter is needed.

Characteristics:

  • High transmission values (up to 99%)
  • Low absorption values (<1%)
  • Excellent temperature stability
  • Durable and resistant to scratches and abrasion

These optical filters are designed for specific applications where precise control over spectral content is critical. Their excellent quality, durability, and precision make them an ideal choice for various industries and research fields.


MaterialOptical Glass, Fused Silica, quartz
Diameter Tolerance+0/-0.15 mm
Thickness Tolerance+/-0.15 mm
Cler Apertureover 90%
Surface Quality80/50~10/5 scratch and dig
Flatness<λ/4@632.8 nm
Parallelism<5 Arc seconds
Chamfer0.1-0.5 mm x 45 degree
Coatingavailable
Usageoptical system, photography sysem, Lighting system





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