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Titanium Silicon Sputtering Target (TiSi) alloy 85:15/ 80:20 / 75:25 at% TiSi sputtering target has a wide range of application prospects in machining, electronics, optics and other fields. TiSi target is produced by hot isostatic pressing, smelting and ...
Titanium Silicon Sputtering Target (TiSi) alloy 85:15/ 80:20 / 75:25 at% TiSi sputtering target has a wide range of application prospects in machining, electronics, optics and other fields. TiSi target is produced by hot isostatic pressing, smelting and ... more
Brand Name:JINXING
Model Number:Titanium Silicon Sputtering Target
Place of Origin:China
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m Name Chrome target 99.95% Pure chrome 3N5 Purity 99.7%,99.95%, 99.98% Shape Square /round, according to your request Available size Round: dia 25~350mm Rectangular: length up to 1000mm Customization is available Impurity content lower than 100ppm ...
m Name Chrome target 99.95% Pure chrome 3N5 Purity 99.7%,99.95%, 99.98% Shape Square /round, according to your request Available size Round: dia 25~350mm Rectangular: length up to 1000mm Customization is available Impurity content lower than 100ppm ... more
Brand Name:Fitow
Model Number:FM20150618
Place of Origin:china
Chromium sputter target, sputter target, Metal sputter target
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... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and
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....995% Circular Ti Titanium Sputtering Target PVD coating Grade 1 Titanium Arc Target Ti Target titanium sputtering target ★ Material Titanium titanium grade 1 Key words Titanium sputtering target Titanium sputtering target , target pure titanium target,
....995% Circular Ti Titanium Sputtering Target PVD coating Grade 1 Titanium Arc Target Ti Target titanium sputtering target ★ Material Titanium titanium grade 1 Key words Titanium sputtering target Titanium sputtering target , target pure titanium target, more
Brand Name:QUALITY METALS
Model Number:CDX--TB-2021023
Place of Origin:China
CNC Rhodium Metal Sputtering Target Purity 95% For Liquid Crystal Display
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...Sputtering Targets For The Semiconductor Industry 1. Description Of Molybdenum Sputtering Targets For The Semiconductor Industry: Molybdenum is a versatile refractory metal with outstanding mechanical qualities, a low coefficient of expansion, strong thermal conductivity, and exceptionally high electrical conductivity at high temperatures. There are numerous combinations that can be used as sputtering targets...
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.../Gr7/Gr9/Gr12 Origin Baoji city Shaanxi Province china shape Round target / plate target / tube target Titanium content ≥99.6 (%) Impurity content <0.02 (%) Density 4.51 or 4.50 Standard ASTM B381 Size 1.Diameter 98mm ...
.../Gr7/Gr9/Gr12 Origin Baoji city Shaanxi Province china shape Round target / plate target / tube target Titanium content ≥99.6 (%) Impurity content <0.02 (%) Density 4.51 or 4.50 Standard ASTM B381 Size 1.Diameter 98mm ... more
Brand Name:LHTi
Model Number:Titanium target
Place of Origin:China
Polished Titanium Sputter Target / Vacuum Coating Titanium Target
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...Sputtering Target For CD-ROM , Decoration Description: Titanium Round Target Material Type Size Ti Target Ni Target Zr Target Mo Target Ti-Al Target SSTarget Round Common:Dia100*40,Dia80*40,Dia60*40 According to Customers' Requirements Plate Target Material Type Size Ti Target Ni Target Zr Target Mo Target Ti-Al Target SS Target Plate According to Customers' Requirements Applications: Titanium target...
...Sputtering Target For CD-ROM , Decoration Description: Titanium Round Target Material Type Size Ti Target Ni Target Zr Target Mo Target Ti-Al Target SSTarget Round Common:Dia100*40,Dia80*40,Dia60*40 According to Customers' Requirements Plate Target Material Type Size Ti Target Ni Target Zr Target Mo Target Ti-Al Target SS Target Plate According to Customers' Requirements Applications: Titanium target... more
Brand Name:NewFuture Titanium
Model Number:Titanium Sputtering Target
Place of Origin:Shanxi China (mainland)
PVD Titan Metal Sputtering Targets 99.7% Electronic Sputtering For CD ROM
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...materials onto a substrate. Sputtering is a process in which atoms from the target material are ejected and deposited onto a substrate, creating a thin film. Tungsten sputtering targets are made from high-purity tungsten and are used for applications that
...materials onto a substrate. Sputtering is a process in which atoms from the target material are ejected and deposited onto a substrate, creating a thin film. Tungsten sputtering targets are made from high-purity tungsten and are used for applications that more
Brand Name:HaiChuan
Model Number:60
Place of Origin:China
High Quality High Purity High Density Forged Tungsten Sputtering Target
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... sheets, base plates, sputtering targets, crucibles in electronic and vacuum applications. Molybdenum sputtering targets possess higher density and smaller average particle size, so that you can benefit from a faster process due to higher sputtering speed.
... sheets, base plates, sputtering targets, crucibles in electronic and vacuum applications. Molybdenum sputtering targets possess higher density and smaller average particle size, so that you can benefit from a faster process due to higher sputtering speed. more
Model Number:Mo1 Molybdenum Plate
Minimum Order Quantity:Negotiate
Price:Negitionable
Mo1 Chrome Molybdenum Steel Plate ASTM B386 For Molybdenum Sputtering Target
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NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy Products Description Product Name Nickel 200 Width 1000mm/1219mm/1240mm/1500mm or as customer's requirements Technique Hot rolled cold rolled Length as customer's request Surface ...
NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy Products Description Product Name Nickel 200 Width 1000mm/1219mm/1240mm/1500mm or as customer's requirements Technique Hot rolled cold rolled Length as customer's request Surface ... more
Brand Name:TOBO
Place of Origin:CHINA
Certification:ISO/PED/TUV/SGS/LR/BV
NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy
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zirconium round target price,sputtering target for coating 1. Product name: High purity Zirconium Targets 2. Purity: Zr+Hf>99.95%, Hf<300ppm. 3. Confirmation: ISO9001:2008certified 4. Standard:GB/T OR ASTM 5.Trace Elements ...
zirconium round target price,sputtering target for coating 1. Product name: High purity Zirconium Targets 2. Purity: Zr+Hf>99.95%, Hf<300ppm. 3. Confirmation: ISO9001:2008certified 4. Standard:GB/T OR ASTM 5.Trace Elements ... more
Brand Name:Hongtech-TI
Model Number:1pc
Place of Origin:china
zirconium round target price,sputtering target for coating
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...below 300mm and the thickness is above 0.3mm. Widely used in vacuum coating industry, target materials raw materials, aerospace industry, Marine automobile industry, electrical industry, instruments industry, etc. We produce tungsten targets that made with
...below 300mm and the thickness is above 0.3mm. Widely used in vacuum coating industry, target materials raw materials, aerospace industry, Marine automobile industry, electrical industry, instruments industry, etc. We produce tungsten targets that made with more
Brand Name:FOTMA
Model Number:Customized Tungsten Targets
Place of Origin:P.R. China
ASTM B760 Polished Tungsten Sputtering Target 100mm Tungsten Disc
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...sputter pure metal targets like: Chrome, Titanium, Aluminum, Copper, Stainless Steel, Nickle, Silver, Gold for high conductive films. DC Sputtering is a Thin Film Physical Vapor Deposition (PVD) Coating technique where a target material to be used as the
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... Target, Zr Sputtering Target, Zr Metal Sputtering Target 1. Product name: High purity Zirconium Targets 2. Purity: Zr+Hf>99.95%, Hf<300ppm. 3. Confirmation: ISO9001:2008 certified 4. Standard:GB/T OR ASTM B550 5....
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Description of Titanium Gr5-eli Target Titanium Gr5-eli Target is called Titanium Grade 23—Titanium alloy (6 % aluminum, 4 %vanadium with extra low interstitial elements, ELI) Titanium Gr5-eli Target is a titanium alloy that is composed of 6 % aluminum...
Description of Titanium Gr5-eli Target Titanium Gr5-eli Target is called Titanium Grade 23—Titanium alloy (6 % aluminum, 4 %vanadium with extra low interstitial elements, ELI) Titanium Gr5-eli Target is a titanium alloy that is composed of 6 % aluminum... more
Brand Name:Changsheng
Model Number:ASTM
Place of Origin:China
Titanium Gr5-Eli Target Grade 23 Block For Dental Implant ASTM F136
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...Sputtering Deposition in Decorative Coating Field Applications Applications Specific Purpose Material Type Decorative coating Colored film, Metallized film Al2O3, TiO2, and all kinds of metal films Working Principle Magnetron sputtering is to increase sputtering rate by introducing a magnetic field on the target...
...Sputtering Deposition in Decorative Coating Field Applications Applications Specific Purpose Material Type Decorative coating Colored film, Metallized film Al2O3, TiO2, and all kinds of metal films Working Principle Magnetron sputtering is to increase sputtering rate by introducing a magnetic field on the target... more
Brand Name:ZEIT
Model Number:MSC-DC-X—X
Place of Origin:Chengdu, P.R.CHINA
Colored Metallized Film Magnetron Sputtering Coating Machine For Decorative Coating Field
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... DC Magnetron Sputtering Power Supply Amount According To Target Amount Bias Power Supply Amount 1 Set PVD Coating Machine Advantage 1) Environmental Friendly 2) High Energy Efficiency 3) Easy Operation 4) ...
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...Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering
...Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering more
Brand Name:Sanhui
Model Number:Mo1
Place of Origin:Henan, China
10.2g/Cm3 Pure Molybdenum Rectangular/Round Plate Sputtering Target For Coating
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Material: metal Diameter:18cm
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... of high-quality material with a thickness of 5-10mm and a tolerance of ±0.1mm. The size of the target plate can be customized. It is designed to achieve a high-pressure steam purge finish Ra1.6 aluminum target plate. And the product will be packaged in
... of high-quality material with a thickness of 5-10mm and a tolerance of ±0.1mm. The size of the target plate can be customized. It is designed to achieve a high-pressure steam purge finish Ra1.6 aluminum target plate. And the product will be packaged in more
Brand Name:Ze Xu
Model Number:According to pipe design
Place of Origin:Yanshan, Hebei, China
Continuous Sputtering Purge Iron Target Plate Rectangle High Pressure